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177 results on '"Wong, H.-S. Philip"'

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2. Forming-Free Selectors Based on Te in an Insulating SiO xMatrix

3. Effect of Back-Gate Dielectric on Indium Tin Oxide (ITO) Transistor Performance and Stability

4. Forming-Free Selectors Based on Te in an Insulating SiOx Matrix

5. Comprehensive Study of Contact Length Scaling Down to 12 nm With Monolayer MoS2 Channel Transistors

6. Comprehensive Study of Contact Length Scaling Down to 12 nm With Monolayer MoS$_{\text{2}}$ Channel Transistors

7. Ab Initio Computational Screening and Performance Assessment of van der Waals and Semimetallic Contacts to Monolayer WSe$_{\text{2}}$ P-Type Field-Effect Transistors

9. SAPIENS: A 64-kb RRAM-Based Non-Volatile Associative Memory for One-Shot Learning and Inference at the Edge

11. Ab Initio Computational Screening and Performance Assessment of van der Waals and Semimetallic Contacts to Monolayer WSe2 P-Type Field-Effect Transistors

12. Effect of parasitic resistance and capacitance on performance of InGaAs HEMT digital logic circuits

13. Measurement of subnanosecond delay through multiwall carbon-nanotube local interconnects in a CMOS integrated circuit

14. Integrating phase-change memory cell with Ge nanowire diode for crosspoint memory-experimental demonstration and analysis

15. An analytical derivation of the density of states, effective mass, and carrier density for achiral carbon nanotubes

16. A compact SPICE model for carbon-nanotube field-effect transistors including nonidealities and its application - part II: full device model and circuit performance benchmarking

17. A compact SPICE model for carbon-nanotube field-effect transistors including nonidealities and its application - part I: model of the intrinsic channel region

18. Schottky-barrier carbon nanotube field-effect transistor modeling

19. Metrics for performance benchmarking of nanoscale Si and Carbon nanotube FETs including device nonidealites

21. Fabrication of metal gated FinFETs through complete gate silicidation with Ni

22. Design Space Analysis for Cross-Point 1S1MTJ MRAM: Selector–MTJ Cooptimization

23. Demonstration of 40-nm Channel Length Top-Gate p-MOSFET of WS2 Channel Directly Grown on SiO$_{{x}}$ /Si Substrates Using Area-Selective CVD Technology

27. Demonstration of 40-nm Channel Length Top-Gate p-MOSFET of WS2 Channel Directly Grown on SiOx/Si Substrates Using Area-Selective CVD Technology.

31. 3-D Resistive Memory Arrays: From Intrinsic Switching Behaviors to Optimization Guidelines

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