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This paper demonstrates a breakthrough method of visible laser probing (VLP), including an optimized 577 nm laser microscope, visible-sensitive detector, and an ultimate-resolution gallium phosphide-based solid immersion lens on the 10 nm node, showing a 110 nm resolution. This is 2x better than what is achieved with the standard suite of probing systems using typical infrared (IR) wavelengths today. Since VLP provides a spot diameter reduction of 0.5x over IR methods, it is reasonable, based simply on geometry, to project that VLP using the 577 nm laser will meet the industry needs for laser probing for both the 10 nm and 7 nm process nodes. Based on its high level of optimization, including high resolution and specialized solid immersion lens, it is highly likely that this VLP technology will be one of the last optically-based fault isolation methods successfully used.

In this paper, we report on the first observation and study of two-photon absorption (TPA) based laser assisted device alteration (LADA) using a continuous-wave (CW) 1340nm laser. The study was conducted using LADA systems equipped with high numerical aperture (NA) liquid and solid immersion lens objectives on Intel’s 45 nm and 32 nm multiprocessor units (MPU) and test chips. The power densities achievable using these lenses are similar to those reported in the literature for TPA in silicon of CW 1455nm light [1]. We show that the induced photocurrent has a quadratic dependence on the input laser power, a key indicator of two-photon phenomenon. Our results imply that even when using 1340nm wavelength CW lasers, there is a potential for laser invasiveness with the high power densities achievable using high NA objectives. Laser induced damage of the DUT is also a possibility at these high power densities, particularly with the solid immersion lens (SIL). However, we show that the DUT damage threshold can be increased by reducing the DUT’s temperature. Finally, we present results demonstrating a >40% improvement in localization of critical timing faults using TPA based LADA, when compared to traditional 1064nm wavelength (single-photon absorption) LADA.

This paper presents the first single element time resolved emission (TRE) data collected from microprocessors fabricated with 0.13 µm process silicon using tester loop lengths, and in many cases acquisition times, comparable to laser voltage probing. The data presented here demonstrate that TRE tools with highly sensitive single element detectors can be used for practical microprocessor circuit diagnostics with reasonable acquisition times.

Single probe beam phase-sensitive detection has been applied to backside optical probing using an interferometer with a novel vibration cancellation scheme. Improved waveform quality and consistency, compared to amplitude-sensitive detection, has been successfully demonstrated on a number of CMOS microprocessors based on the 0.18 um logic process technology. The interferometric probing scheme will be described in detail and results will be presented.

A novel optical probing technique to measure voltage waveforms from flip-chip packaged complementary metal-oxide-semiconductor (CMOS) integrated circuits (IC) is described. This infrared (IR) laser based technique allows signal waveform acquisition and high frequency timing measurement directly from active PN junctions through the silicon backside substrate on IC’s mounted in flip-chip, stand-alone, or multi-chip module packages as well as wire-bond packages on which the chip backside is accessible. The technique significantly improves silicon debug & failure analysis (FA) through-put time (TPT) as compared to backside electron-beam (E-beam) probing because of the elimination of backside trenching and probe hole generation operations.

Optical probing using the Schlumberger IDS-2000 and other infrared-based analysis techniques have proved to be critical in the debug and analysis of flip-chip-packaged microprocessors. During probing, processors are operating with test patterns that generate a large amount of power. This article demonstrates a method for dissipating the generated heat based on a diamond window-based transparent heat spreader. This method controls the microprocessor temperature to a high degree of stability, and reduces thermal gradients across the die. Waveform results are excellent, and the transparent heat spreader provides a path for optical probing to be applied to the entire range of integrated circuit applications. The discussion covers cooling system requirements, and standard configuration specifications, and shows how the transparent heat spreader technique is effective for probing high power microprocessors.

With the advent of C4 packaging technology, Intel has developed, in conjunction with a technology partner, an integrated, laser-based optical backside probing system. This article begins with a description of the basic system operation. This is followed by a discussion on the electro-optic effect in CMOS, which is used for the signal acquisition. The question of invasiveness of the photo-injected carriers is then discussed. Information on the entire probing environment is also provided. The article also discusses results and presents a comparison with other waveform acquisition techniques. It ends with a brief discussion on the developments needed to scale the technique to future processes.