20 results on '"Chen, Mao"'
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2. Formation of cobalt-silicided p+n junctions using implant through silicide technology
3. Role of fluorine atoms on the thermal stability of the silicide/silicon structure
4. Thermal stability of cobalt silicide thin films on Si(100).
5. Low-temperature reaction of thin-film platinum (≤300 Å) with (100) silicon.
6. Formation and characterization of a PtSi contacted n+p shallow junction.
7. Formation of PtSi-contacted p+n shallow junctions by BF+2 implantation and low-temperature furnace annealing.
8. High-temperature stability of platinum silicide associated with fluorine implantation.
9. Silicon etching mechanism and anisotropy in CF4+O2 plasma.
10. Formation of n+p shallow junction by As+ implantation through CoSi2 film.
11. Ternary NiFeX as soft biasing film in a magnetoresistive sensor.
12. Formation of 0.1-μm n+p junction by As+ implantation through Pt or PtSi film.
13. Wear resistance of iron oxide thin films.
14. The microstructure of iron oxide thin films.
15. Laminated CoZr amorphous thin-film recording heads.
16. Formation ofn+pshallow junction by As+implantation through CoSi2film
17. Formation of cobalt‐silicidedp+njunctions using implant through silicide technology
18. Formation of PtSi‐contactedp+nshallow junctions by BF+2implantation and low‐temperature furnace annealing
19. Formation and characterization of a PtSi contactedn+pshallow junction
20. Formation of 0.1‐μmn+pjunction by As+implantation through Pt or PtSi film
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