1. Pressure dependence of singly and doubly charged ion formation in a HiPIMS discharge
- Author
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Vitezslav Stranak, Rainer Hippler, Martin Cada, Christiane A. Helm, and Zdeněk Hubička
- Subjects
010302 applied physics ,Materials science ,Dimer ,Analytical chemistry ,General Physics and Astronomy ,02 engineering and technology ,Sputter deposition ,021001 nanoscience & nanotechnology ,Mass spectrometry ,01 natural sciences ,Spectral line ,Cathode ,Ion ,law.invention ,chemistry.chemical_compound ,Monomer ,chemistry ,Physics::Plasma Physics ,law ,0103 physical sciences ,High-power impulse magnetron sputtering ,0210 nano-technology - Abstract
Generation of singly charged Ar + and Ti +, doubly charged Ar 2 + and Ti 2 +, and of Ar 2 + and Ti 2 + dimer ions in a high power impulse magnetron sputtering (HiPIMS) discharge with a Ti cathode was investigated. Energy-resolved mass spectrometry was employed. The argon gas pressures varied between 0.5 and 2.0 Pa. Energy spectra of monomer ions are composed of low- and high-energy components. The energetic position of the high-energy component is approximately twice as large for doubly charged ions compared to singly charged ions. Intensities of Ar 2 + and Ti 2 + dimer ions are considerably smaller during HiPIMS compared to dc magnetron sputtering.
- Published
- 2019
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