1. Synthesis of vertically aligned wafer-scale tantalum disulfide using high-Ar/H2S ratio plasma
- Author
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In-Keun Baek, Sanghuck Jeon, Hyunho Seok, Eungchul Kim, Inkoo Lee, Dougyong Sung, Cheol-Hun Lee, Jinill Cho, Taesung Kim, and Kihong Park
- Subjects
Materials science ,Nanostructure ,Mechanical Engineering ,Tantalum ,Analytical chemistry ,chemistry.chemical_element ,Bioengineering ,General Chemistry ,Plasma ,Chemical vapor deposition ,chemistry ,X-ray photoelectron spectroscopy ,Mechanics of Materials ,Plasma-enhanced chemical vapor deposition ,Transmission electron microscopy ,General Materials Science ,Wafer ,Electrical and Electronic Engineering - Abstract
Nanostructural modification of two-dimensional (2D) materials has attracted significant attention for enhancing hydrogen evolution reaction (HER) activity. In this study, the nanostructure of TaS2 films was controlled by controlling the Ar/H2S gas ratio used in plasma-enhanced chemical vapor deposition (PECVD). At a high Ar/H2S gas ratio, vertically aligned TaS2 (V-TaS2) films were formed over a large-area (4 in) at a temperature of 250 °C, which, to the best of our knowledge, is the lowest temperature reported for PECVD. Furthermore, the plasma species formed in the injected gas at various Ar/H2S gas ratios were analyzed using optical emission spectroscopy to determine the synthesis mechanism. In addition, the 4 in wafer-scale V-TaS2 was analyzed by x-ray photoelectron spectroscopy, transmission electron microscopy, and atomic force microscopy, and the HER performance of the as-synthesized TaS2 fabricated with various Ar/H2S ratios was measured. The results revealed that, depending on the film structure of TaS2, the HER performance can be enhanced owing to its structural advantage. Furthermore, the excellent stability and robustness of V-TaS2 was confirmed by conducting 1000 HER cycles and post-HER material characterization. This study provides important insights into the plasma-assisted nanostructural modification of 2D materials for application as enhanced electrocatalysts.
- Published
- 2021
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