1. Deep p-Ring Trench Termination: An Innovative and Cost-Effective Way to Reduce Silicon Area
- Author
-
Neophytos Lophitis, Chiara Corvasce, U. Badstuebner, Florin Udrea, Munaf Rahimo, Umamaheswara Vemulapati, Marina Antoniou, Antoniou, M [0000-0002-7544-3784], Lophitis, N [0000-0002-0901-0876], Udrea, F [0000-0002-7288-3370], Rahimo, M [0000-0002-4632-5463], and Apollo - University of Cambridge Repository
- Subjects
termination ,010302 applied physics ,Materials science ,Silicon ,business.industry ,chemistry.chemical_element ,High voltage ,P ring ,01 natural sciences ,Electronic, Optical and Magnetic Materials ,Power semiconductor devices ,high voltage ,Reliability (semiconductor) ,chemistry ,Hardware_GENERAL ,Logic gate ,0103 physical sciences ,Trench ,Hardware_INTEGRATEDCIRCUITS ,Optoelectronics ,Electric potential ,Electrical and Electronic Engineering ,business ,Hot-carrier injection - Abstract
A new type of high-voltage termination, namely the “deep p-ring trench” termination design for high-voltage, high-power devices, is presented and extensively simulated. Termination of such devices consumes a large proportion of the chip size; the proposed design concept not only reduces the termination silicon area required but also removes the need for an additional mask as is the case of the traditional p+ ring-type termination. Furthermore, the presence of the p-ring under and around the bottom of the trench structure reduces the electric field peaks at the corners of the oxide, which results in reduced hot carrier injection and improved device reliability.
- Published
- 2019