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Polycrystalline Al workpieces go through a complex surface atom sputtering and surface/subsurface atom diffusion throughout the ion beam machining process that plays a critical role in determining machining quality of optical mirror surfaces. Here, we leverage molecular dynamics method for the first time to reveal the machining mechanism and the polycrystalline effect of aluminum during ion beam sputtering, in term of cascade collision, atom trajectory, sputtering yield, and surface characteristic. Polycrystalline Al presents a significant low potential energy state, leading to milder cascade collision and weaker sputtering effects than monocrystalline Al during ion beam machining. The atom trajectory demonstrates irregular variation as the atom diffusion is blocked by grain boundary (GB) in polycrystalline Al, leading to the relief microstructure and poor surface quality. With incident ions increasing, the GBs are broken and atom diffusion enhancing, as well as lower subsurface defects and better finishing surface quality. The microscopic morphology evolves into gravel microstructure. Simulation results also reveal that atom diffusion will benefit from high ion concentration and low ion energy. Sputtering yield variation is more sensitive to ion energy. To acquiring better finishing surface quality of Al without influencing machining efficiency, ion concentration must be increased while the ion energy needs to be decreased appropriately but a large number of cascading collisions need to be ensured. • The machining mechanism and polycrystalline effect of Al during ion beam sputtering are investigated via molecular dynamics simulation. • Cascade collision is milder in polycrystalline Al, and atom trajectory demonstrates irregular variation as the atom diffusion blocked by grain boundary. • Impeding effect of grain boundaries induces the relief microstructure. With incident ions increasing, the grain boundaries are broken, and the gravel structure dominates the surface morphology. • Lower ion energy and higher ion concentration will benefit atomic diffusion, inducing a better finishing surface roughness. [ABSTRACT FROM AUTHOR]

In order to realize low-defect fabrication of optical elements, detection and characterization methods of damage precursors related to laser damage performance were summarized herein. It was proposed that nanoscale damage precursors and chemical structural defects were the focus in low damage fabrication. Combined with the development of optical elements, methods for mitigating nanoscale damage precursor were discussed to effectively decrease nanoscale contaminations and chemical structural defects based on chemical-assisted magnetorheological polishing and ion beam sputtering cleaning technology. Three challenges in low-defect fabrication of optical elements in high influence were introduced, which might be a reference for the clean manufacturing of optical elements. [ABSTRACT FROM AUTHOR]

One-dimensional ion-beam figuring (1D-IBF) can improve grazing-incidence reflective optics, such as Kirkpatrick-Baez mirrors. 1D-IBF requires only one motion degree of freedom, which reduces equipment complexity, resulting in compact and low-cost IBF instrumentation. Furthermore, 1D-IBF is easy to integrate into a single vacuum system with other fabrication processes, such as a thin-film deposition. The NSLS-II Optical Metrology and Fabrication Group has recently integrated the 1D-IBF function into an existing thin-film deposition system by adding an RF ion source to the system. Using a rectangular grid, a 1D removal function needed to perform 1D-IBF has been produced. In this paper, demonstration experiments of the 1D-IBF process are presented on one spherical and two plane samples. The final residual errors on both plane samples are less than 1 nm r.m.s. The surface error on the spherical sample has been successfully reduced by a factor of 12. The results show that the 1D-IBF method is an effective method to process high-precision 1D synchrotron optics. [ABSTRACT FROM AUTHOR]

Ion beam figuring (IBF) provides a deterministic figuring method for fabricating ultra-high precision optical components such as lithographic objective lenses. But in the previous IBF process, the convergence of surface accuracy is often uncertain. Therefore, the iterative processing methods are mostly adopted. In the iterative process, the convergence ratio (the ratio of root mean square before and after figuring) of single figuring is relatively low. With the improvement of machining accuracy, the convergence ratio continues to decrease. The study analyzes the factors that limit the convergence ratio of single processing and the influence form and degree of each element on the convergence ratio. Furthermore, we present an IBF strategy with a high convergence ratio based on an optimized removal function. Based on this strategy, we complete the figuring experiment. The convergence ratio is much higher than the previous level. Compared with the surface of iterative figuring, the surface is simple and more favorable to figuring to sub-nanometer precision. The experimental results show that we can optimize the removal function to achieve rapid optical surface fabrication with nanometer precision. • A rapid manufacturing method with a high convergence ratio for nanometer precision optical elements is explored. • A more comprehensive analysis of the factors affecting the single IBF processing convergence ratio. • The method is based on the dynamic adjustment of equipments' performance to pursue the best convergence effect. • Evaluation of equipment processing capability while improving processing efficiency. [ABSTRACT FROM AUTHOR]

Surface slope profile is widely used in the metrology of grazing-incidence reflective optics instead of surface height profile. Nevertheless, the theoretical and experimental model currently used in deterministic optical figuring processes is based on surface height, not on surface slope. This means that the raw slope profile data from metrology need to be converted to height profile to perform the current height-based figuring processes. The inevitable measurement noise in the raw slope data will introduce significant cumulative error in the resultant height profiles. As a consequence, this conversion will degrade the determinism of the figuring processes, and will have an impact on the ultimate surface figuring results. To overcome this problem, an innovative figuring model is proposed, which directly uses the raw slope profile data instead of the usual height data as input for the deterministic process. In this paper, first the influence of the measurement noise on the resultant height profile is analyzed, and then a new model is presented; finally a demonstration experiment is carried out using a one-dimensional ion beam figuring process to demonstrate the validity of our approach. [ABSTRACT FROM AUTHOR]

Aluminum optics are widely used in modern optical systems because of their high specific stiffness and high reflectance. With the applied optical frequency band moving to visible, traditional processing technology cannot meet the processing precision. Ion beam sputtering (IBS) provides a highly deterministic technology for high-precision aluminum optics fabrication. However, the surface quality is deteriorated after IBS. The interaction between the bombard atoms and the surface morphology evolution mechanism are not clear, and systematic research is needed. Thus, in this paper, the IBS process for single crystal aluminum with different crystallographic orientations are studied by the molecular dynamics method. The ion beam sputter process is firstly demonstrated. Then, the variation of sputter yield of the three crystal faces is analyzed. The sputter yield difference of different crystal surfaces causes the appearance of the relief structure. Then, the gravel structure generates on the single crystal surfaces and dominates the morphology evolution. The state of the atom diffusion of the specific crystal surfaces will determine the form of the gravel structure. Furthermore, the form and distribution of subsurface damage and stress distribution of three different crystal surfaces are analyzed. Although there are great differences in defect distribution, no stress concentration was found in three workpieces, which verifies that the ion beam sputter is a stress-free machining method. The process of IBS and the mechanism of morphology evolution of aluminum are revealed. The regularity and mechanism will provide a guidance for the application of IBS in aluminum optics manufacture fields. [ABSTRACT FROM AUTHOR]

• Ion beam polishing is investigated using atomic simulation. • Material removal and surface evolution during ion beam polishing are studied. • Higher ion dose leads to better machined surface quality, but increases thickness of amorphous layer. • Surface roughness depends on the Ar ion kinetic energy. The ion beam polishing techniques for silicon wafers play a key role in the fabrication of optical element. However, the dynamical ion beam polishing process at nanoscale time and space is very difficult to be recorded and observed, which most directly affects the quality of the machined surface. Here, the material removal and surface generation process during ion beam polishing are investigated using atomic simulation. In order to reveal the effects of the Ar ion dose, surface roughness, and Ar ion energy on surface integrity and subsurface damage, the surface topography, stress distribution, material removal rate, and radial distribution function are calculated and analyzed. As a result, the higher ion dose would generate the better machined surface quality, but increases the thickness of the amorphous layer. The initial surface roughness, including hill height and diameter, strongly affects the surface quality, due to the ion implantation depth to fall behind the maximum roughness value. Moreover, the average surface roughness, the material removing rate, and amorphous structure are significantly related to the Ar ion kinetic energy. This work demonstrates the potential of reasonable parameter optimization to prepare the ion beam polishing sample with high precision and few defects for optics applications. [ABSTRACT FROM AUTHOR]

Nanoscale laser damage precursors generated from fabrication have emerged as a new bottleneck that limits the laser damage resistance improvement of fused silica optics. In this paper, ion beam etching (IBE) technology is performed to investigate the evolutions of some nanoscale damage precursors (such as contamination and chemical structural defects) in different ion beam etched depths. Surface material structure analyses and laser damage resistance measurements are conducted. The results reveal that IBE has an evident cleaning effect on surfaces. Impurity contamination beneath the polishing redeposition layer can be mitigated through IBE. Chemical structural defects can be significantly reduced, and surface densification is weakened after IBE without damaging the precision of the fused silica surface. The photothermal absorption on the fused silica surface can be decreased by 41.2%, and the laser-induced damage threshold can be raised by 15.2% after IBE at 250 nm. This work serves as an important reference for characterizing nanoscale damage precursors and using IBE technology to increase the laser damage resistance of fused silica optics. [ABSTRACT FROM AUTHOR]

Metallic elements can contaminate single crystal silicon mirror during ion beam etching (IBE) and other postprocessing methods, which can affect the performance of components in an infrared laser system. In this work, scanning electron microscope (SEM) and atomic force microscope (AFM) were used to characterize the distribution of contaminant represented by aluminum (Al). After characterizing contaminated area, elastic jet polishing (EJP), EJP, and static alkaline etching (SAE) combined technique were used to process the mirror. The morphology and laser-induced absorption were measured. Results show that metallic elements can mix with silicon and generate bulges due to the sputtering effect. In addition, SAE and EJP combined technique can remove metallic contaminant and stabilize the surface quality. Research results can be a reference on conducting postprocessing technologies to improve laser damage resistance property of single crystal silicon mirror in infrared laser system. [ABSTRACT FROM AUTHOR]