1. Ferroelectric switching of poly(vinylidene difluoride-trifluoroethylene) in metal-ferroelectric-semiconductor non-volatile memories with an amorphous oxide semiconductor
- Author
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A. J. J. M. van Breemen, Brian Cobb, Gerwin H. Gelinck, and Molecular Materials and Nanosystems
- Subjects
Materials science ,Physics and Astronomy (miscellaneous) ,HOL - Holst ,02 engineering and technology ,01 natural sciences ,Ferroelectric capacitor ,law.invention ,law ,Ferroelectric switching ,0103 physical sciences ,Semiconducting indium ,010302 applied physics ,Indium gallium zinc oxide ,Indium gallium zinc oxides ,TS - Technical Sciences ,Industrial Innovation ,business.industry ,Transistor ,Biasing ,021001 nanoscience & nanotechnology ,Ferroelectricity ,Ferroelectric polarization ,Capacitor ,Semiconductor ,Thin film devices ,Thin-film transistor ,Optoelectronics ,Nano Technology ,0210 nano-technology ,business ,Amorphous oxide semiconductor (AOS) - Abstract
Ferroelectric polarization switching of poly(vinylidene difluoride-trifluoroethylene) is investigated in different thin-film device structures, ranging from simple capacitors to dual-gate thin-film transistors (TFT). Indium gallium zinc oxide, a high mobility amorphous oxide material, is used as semiconductor. We find that the ferroelectric can be polarized in both directions in the metal-ferroelectric-semiconductor (MFS) structure and in the dual-gate TFT under certain biasing conditions, but not in the single-gate thin-film transistors. These results disprove the common belief that MFS structures serve as a good model system for ferroelectric polarization switching in thin-film transistors. cop. 2015 AIP Publishing LLC.
- Published
- 2015