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293 results on '"Adelmann, Christoph"'

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251. Atomic Layer Deposition of Gadolinium Aluminate using Gd(iPrCp)3, TMA, and O3or H2O

252. Extreme Scaled Gate Dielectrics By Using ALD HfO2/SrTiO3 Composite Structures

253. Atomic Layer Deposition of GdHfOx Thin Films

254. Physical Characterization of the Metal/High-k Layer Interaction upon Annealing

255. Capacitance-Voltage (CV) Characterization of GaAs-Oxide Interfaces

256. Replacing SiO2 - Material and Processing Aspects of New Dielectrics

257. DyScHfOx as High-? Gate Dielectrics: Structural and Electrical Properties

258. The Impact of Stacked Cap Layers on Effective Work Function With HfSiON and SiON Gate Dielectrics.

259. Magnetoelectric coupling in Ba:Pb(Zr,Ti)O3/Co40Fe40B20 nanoscale waveguides studied by propagating spin-wave spectroscopy.

260. Probing Magnetic Defects in Ultra-Scaled Nanowires with Optically Detected Spin Resonance in Nitrogen-Vacancy Center in Diamond

261. 2-Output Spin Wave Programmable Logic Gate

262. Multifrequency Data Parallel Spin Wave Logic Gates.

263. Analytical techniques for precise characterization of nanomaterials.

264. Fan-out enabled spin wave majority gate.

265. Spin Wave Normalization Toward All Magnonic Circuits.

266. High-drive current (>1MA/cm2) and highly nonlinear (>103) TiN/amorphous-Silicon/TiN scalable bidirectional selector with excellent reliability and its variability impact on the 1S1R array performance.

267. Introduction to spin wave computing.

269. Aqueous chemical solution deposition of ultrathin lanthanide oxide dielectric films.

270. Understanding the Interface Reactions of Rutile TiO2Grown by Atomic Layer Deposition on Oxidized Ruthenium

271. CMOS-Compatible Dielectric Constant Engineering by Embedding Metallic Particles in Aluminum Oxide

272. Physical Characterization of High-kHfxAl1-xOyGate Dielectrics Prepared by ALD

273. Development of ALD HfZrOxwith TDEAH, TDEAZ and H2O

274. Atomic Layer Deposition of GdHfOxThin Films

275. Extreme Scaled Gate Dielectrics By Using ALD HfO2/SrTiO3Composite Structures

276. DyScHfOx as High-κ Gate Dielectrics: Structural and Electrical Properties

277. Non-Binary Spin Wave Based Circuit Design.

278. Fully resonant magneto-elastic spin-wave excitation by surface acoustic waves under conservation of energy and linear momentum.

279. Lumped circuit model for inductive antenna spin-wave transducers.

280. The unexpected effects of crystallization on Ta2O5 as studied by HRTEM and C-AFM.

281. 3ω correction method for eliminating resistance measurement error due to Joule heating.

282. Compact tunable YIG-based RF resonators.

283. Electrical spin-wave spectroscopy in nanoscale waveguides with nonuniform magnetization.

284. Al3Sc thin films for advanced interconnect applications.

285. Temperature-dependent resistivity of alternative metal thin films.

286. Experimental Realization of a Passive Gigahertz Frequency‐Division Demultiplexer for Magnonic Logic Networks.

287. Microwave Characterization of Ba-Substituted PZT and ZnO Thin Films.

288. Hall effect measurement for precise sheet resistance and thickness evaluation of Ruthenium thin films using non-equidistant four-point probes.

289. Selective chemical vapor synthesis of Cu3Ge: Process optimization and film properties

290. Finite difference magnetoelastic simulator.

291. Reconfigurable submicrometer spin-wave majority gate with electrical transducers.

292. Ferroelectric Control of Magnetism in Ultrathin HfO 2 \Co\Pt Layers.

293. A majority gate with chiral magnetic solitons.

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