18 results on '"Murto, R.W."'
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2. Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface
3. High-k gate stacks for planar, scaled CMOS integrated circuits
4. Experimental observations of the thermal stability of high-k gate dielectric materials on silicon
5. Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface
6. Effects of Structural Properties of Hf-Based Gate Stack on Transistor Performance.
7. Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface.
8. Integration issues of high-k gate stack: Process-induced charging.
9. Charge trapping in MOCVD hafnium-based gate field dielectric stack structures and its impact on device performance.
10. Physical characterization of high-k gate dielectric film systems processed by RTA and spike anneal.
11. Implementation of a universal exhaust solution for implanter fire prevention.
12. Integration of high-k gate stack systems into planar CMOS process flows
13. Charge trapping in MOCVD hafnium-based gate field dielectric stack structures and its impact on device performance
14. Physical characterization of high-k gate dielectric film systems processed by RTA and spike anneal
15. Conventional poly-Si gate MOS-transistors with a novel, ultra-thin Hf-oxide layer
16. Intrinsic characteristics of high-k devices and implications of fast transient charging effects (FTCE)
17. Charge trapping and device performance degradation in MOCVD hafnium-based gate dielectric stack structures.
18. Conventional poly-Si gate MOS-transistors with a novel, ultra-thin Hf-oxide layer.
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