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Your search keyword '"Noriyuki Uchida"' showing total 192 results

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192 results on '"Noriyuki Uchida"'

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1. Stimuli-responsive self-regulating assembly of chiral colloids for robust size and shape control

2. Activator of KAT3 histone acetyltransferase family ameliorates a neurodevelopmental disorder phenotype in the syntaxin 1A ablated mouse model

3. Reconstitution of microtubule into GTP-responsive nanocapsules

4. Efficient protein incorporation and release by a jigsaw-shaped self-assembling peptide hydrogel for injured brain regeneration

5. Amorphous Hf–O–Te as a selector via a modified conduction mechanism by Te content control

6. Lateral variations of the surface electric potential and elastic stiffness of ultrathin Hf0.5Zr0.5O2 films on silicon

7. Stability and bonding nature for icosahedral or planar cluster of hydrogenated boron or aluminum

8. Physical Enhancement? Nanocarrier? Current Progress in Transdermal Drug Delivery

12. Endocytosis-Like Vesicle Fission Mediated by a Membrane-Expanding Molecular Machine Enables Virus Encapsulation for In Vivo Delivery

13. Self-assembling materials mimicking dynamic bio-interfaces in cellular activities

15. Endocytosis-like vesicle fission by membrane-expanding molecular machine enabling virus encapsulation for in vivo delivery

16. Self-assembly of Amphiphilic Peptide in Phospholipid Membrane

18. Stabilization of bicelles using metal-binding peptide for extended blood circulation

19. Dispersion of Manganese Dioxide Particles Using Anionic Technol PG and Sodium Cholate in the Preparation for Application as Films on Substrates

20. Efficient protein incorporation and release by a jigsaw-shaped self-assembling peptide hydrogel for injured brain regeneration

21. Dispersion of Titanium Oxide Nanoparticles Using Mixtures of Anionic Technol PG and Sodium Cholate

22. Dispersion of Cannabidiol Into Small-Sized Nanoparticles Using Technol PG

23. (Invited) Cluster-Preforming-Deposited Si-Rich W Silicide: A New Contact Material for Advanced CMOS

24. Macroscopically oriented polymeric soft materials: synthesis and functions

25. Physical Mechanisms of Mobility Enhancement in Ultrathin Body GeOI pMOSFETs Fabricated by HEtero-Layer-Lift-Off Technology

26. HMD-based cover test system for the diagnosis of ocular misalignment

27. Fullerene Nanoparticles Using Technol PG for Inexpensive Preparation

29. Solid-phase crystallization of ultra-thin amorphous Ge layers on insulators

30. Bicelle Composed of 1,2-Dipalmitoyl-sn-Glycero-3-Phosphatidylcholine and Sodium Cholate

32. Current Progress in Cross-Linked Peptide Self-Assemblies

33. Raman microscopy and infrared optical properties of SiGe Mie resonators formed on SiO

34. Transdermal Delivery of Anionic Phospholipid Nanoparticles Containing Fullerene

35. Nanoformulation of Fullerene Using an Anionic Phospholipid

36. Kinetically Stable Bicelles with Dilution Tolerance, Size Tunability, and Thermoresponsiveness for Drug Delivery Applications

37. A simple efficient method of nanofilm-on-bulk-substrate thermal conductivity measurement using Raman thermometry

39. Thermal stability of amorphous Si-rich W silicide films composed of W-atom-encapsulated Si clusters.

40. Electronic modification of wet-prepared Si surfaces by a dichlorosilane reaction at elevated temperature

41. Flash lamp annealing processing to improve the performance of high-Sn content GeSn n-MOSFETs

43. Epitaxial growth of Ge thin film on Si (001) by DC magnetron sputtering

44. First Experimental Observation of Channel Thickness Scaling Induced Electron Mobility Enhancement in UTB-GeOI nMOSFETs

45. Tensile strain ultra thin body SiGe on insulator through hetero-layer transfer technique

46. Elastic Response of 10-nm Insulator Films Measured by Dynamic Indentation for Nano-scale Electron Device Fabrication

47. Germanium Layer Transfer with Low Temperature Direct Bonding and Epitaxial Lift-off Technique for Ge-based monolithic 3D integration

48. Backside Si passivation: Leading to high performance UTB GeOI structures for monolithic 3D integrations

49. Si-rich W silicide films composed of W-atom-encapsulated Si clusters deposited using gas-phase reactions of WF6 with SiH4.

50. Si-rich W silicide films composed of W-atom-encapsulated Si clusters deposited using gas-phase reactions of WF6 with SiH4.

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