35 results on '"Wegrzynski, L."'
Search Results
2. Nanoscale Imaging Using a Compact Laser Plasma Source of Soft X-Rays and Extreme Ultraviolet (EUV)
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Wachulak, P., Torrisi, A., Ayele, M., Czwartos, J., Bartnik, A., Jarocki, R., Kostecki, J., Szczurek, M., Węgrzyński, Ł., Fiedorowicz, H., Kawachi, Tetsuya, editor, Bulanov, Sergei V., editor, Daido, Hiroyuki, editor, and Kato, Yoshiaki, editor
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- 2018
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3. Development and characterization of a laser-plasma soft X-ray source for contact microscopy
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Ayele, M.G., Wachulak, P.W., Czwartos, J., Adjei, D., Bartnik, A., Wegrzynski, Ł., Szczurek, M., Pina, L., and Fiedorowicz, H.
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- 2017
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4. Application of Laser Plasma Sources of Soft X-rays and Extreme Ultraviolet (EUV) in Imaging, Processing Materials and Photoionization Studies
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Fiedorowicz, H., Bartnik, A., Wachulak, P. W., Jarocki, R., Kostecki, J., Szczurek, M., Ahad, I. U., Fok, T., Szczurek, A., Wȩgrzyński, Ł., Rocca, Jorge, editor, Menoni, Carmen, editor, and Marconi, Mario, editor
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- 2016
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5. Extreme ultraviolet and soft X-ray imaging with compact, table top laser plasma EUV and SXR sources
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Wachulak, P.W., Bartnik, A., Kostecki, J., Wegrzynski, L., Fok, T., Jarocki, R., Szczurek, M., and Fiedorowicz, H.
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- 2015
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6. Characterization of pulsed capillary channel gas puff target using EUV shadowgraphy
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Wachulak, P.W., Bartnik, A., Węgrzyński, Ł., Fok, T., Kostecki, J., Szczurek, M., Jarocki, R., and Fiedorowicz, H.
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- 2015
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7. Imaging in Nanoscale Using Laser-Plasma Sources of Extreme Ultraviolet (EUV)
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Wachulak, P. W., Bartnik, A., Baranowska-Korczyc, A., Pánek, D., Brůža, P., Kostecki, J., Węgrzyński, Ł., Jarocki, R., Szczurek, M., Fronc, K., Elbaum, D., Fiedorowicz, H., Sebban, Stéphane, editor, Gautier, Julien, editor, Ros, David, editor, and Zeitoun, Philippe, editor
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- 2014
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8. Study of crystalline thin films and nanofibers by means of the laser–plasma EUV-source based microscopy
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Wachulak, P.W., Bartnik, A., Baranowska-Korczyc, A., Pánek, D., Brůža, P., Kostecki, J., Węgrzyński, Ł., Jarocki, R., Szczurek, M., Fronc, K., Elbaum, D., and Fiedorowicz, H.
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- 2013
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9. A stand-alone compact EUV microscope based on gas-puff target source
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Torrisi A., Wachulak P., Wegrzynski L., Fok T., Bartnik A., Parkman T., VondrovA S., TurnovA J., Jankiewicz B. J., Bartosewicz B., Fiedorowicz H., Torrisi, A., Wachulak, P., Wegrzynski, L., Fok, T., Bartnik, A., Parkman, T., Vondrova, S., Turnova, J., Jankiewicz, B. J., Bartosewicz, B., and Fiedorowicz, H.
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Fresnel zone plate ,EUV source ,gas-puff target ,imaging ,EUV microscopy - Abstract
We report on a very compact desk-top transmission extreme ultraviolet (EUV) microscope based on a laser-plasma source with a double stream gas-puff target, capable of acquiring magnified images of objects with a spatial (half-pitch) resolution of sub-50 nm. A multilayer ellipsoidal condenser is used to focus and spectrally narrow the radiation from the plasma, producing a quasi-monochromatic EUV radiation (λ = 13.8 nm) illuminating the object, whereas a Fresnel zone plate objective forms the image. Design details, development, characterization and optimization of the EUV source and the microscope are described and discussed. Test object and other samples were imaged to demonstrate superior resolution compared to visible light microscopy.
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- 2017
10. Nanoscale imaging applications of soft X-ray microscope based on a gas-puff target source
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Wachulak, P. W., primary, Torrisi, A., additional, Bartnik, A., additional, Wegrzynski, L., additional, Fok, T., additional, and Fiedorowicz, H., additional
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- 2017
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11. Soft X-ray microscope with nanometer spatial resolution and its applications
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Wachulak, P. W., additional, Torrisi, A., additional, Bartnik, A., additional, Wegrzynski, L., additional, Fok, T., additional, Patron, Z., additional, and Fiedorowicz, H., additional
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- 2016
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12. Development and applications of x-ray lasers at PALS Centre
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Kozlova, M., primary, Nejdl, J., additional, Klisnick, A., additional, Le Marec, A., additional, Meng, L., additional, Tissandier, F., additional, Fok, T., additional, Wegrzynski, L., additional, Bartnik, A., additional, Wachulak, P., additional, Jarocki, R., additional, and Fiedorowicz, H., additional
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- 2013
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13. Characterization of a dual-gas multi-jet gas puff target for high-order harmonic generation using extreme ultraviolet shadowgraphy
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Wachulak, P.W., primary, Wegrzynski, L., additional, Bartnik, A., additional, Fok, T., additional, Jarocki, R., additional, Kostecki, J., additional, Szczurek, M., additional, and Fiedorowicz, H., additional
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- 2013
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14. Soft X-ray microscope with nanometer spatial resolution and its applications
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Romaniuk, Ryszard S., Kopczynski, Krzysztof, Jabczyński, Jan K., Mierczyk, Zygmunt, Wachulak, P. W., Torrisi, A., Bartnik, A., Wegrzynski, L., Fok, T., Patron, Z., and Fiedorowicz, H.
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- 2016
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15. Generation and characterization of plasma channels in gas puff targets using soft X-ray radiography technique.
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Wachulak, P. W., Bartnik, A., Jarocki, R., Fok, T., Wegrzynski, L., Kostecki, J., Szczurek, M., Jabczynski, J., and Fiedorowicz, H.
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X-rays ,RADIOGRAPHY ,LASER pulses ,PINHOLE cameras ,VELOCITY ,ENERGY density - Abstract
We present our recent results of a formation and characterization of plasma channels in elongated krypton and xenon gas puff targets. The study of their formation and temporal expansion was carried out using a combination of a soft X-ray radiography (shadowgraphy) and pinhole camera imaging. Two high-energy short laser pulses were used to produce the channels. When a pumping laser pulse was shaped into a line focus, using cylindrical and spherical lenses, the channels were not produced because much smaller energy density was deposited in the gas puff target. However, when a point focus was obtained, using just a spherical lens, the plasma channels appeared. The channels were up to 9 mm in length, had a quite uniform density profile, and expanded in time with velocities of about 2 cm/µs. [ABSTRACT FROM AUTHOR]
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- 2014
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16. Development and applications of x-ray lasers at PALS Centre
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Klisnick, Annie, Menoni, Carmen S., Kozlova, M., Nejdl, J., Klisnick, A., Le Marec, A., Meng, L., Tissandier, F., Fok, T., Wegrzynski, L., Bartnik, A., Wachulak, P., Jarocki, R., and Fiedorowicz, H.
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- 2013
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17. Biological Applications of Short Wavelength Microscopy Based on Compact, Laser-Produced Gas-Puff Plasma Source
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Tomasz Fok, Alfio Torrisi, Przemyslaw Wachulak, Henryk Fiedorowicz, Andrzej Bartnik, Łukasz Węgrzyński, Torrisi, A., Wachulak, P. W., Bartnik, A., Wegrzynski, L., Fok, T., and Fiedorowicz, H.
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Microscope ,Materials science ,Extreme ultraviolet lithography ,02 engineering and technology ,01 natural sciences ,lcsh:Technology ,law.invention ,010309 optics ,lcsh:Chemistry ,Optics ,law ,0103 physical sciences ,Microscopy ,soft x-rays ,General Materials Science ,Instrumentation ,Image resolution ,lcsh:QH301-705.5 ,Fluid Flow and Transfer Processes ,Water window ,laser-matter interaction ,business.industry ,lcsh:T ,Microscopy, Gas-puff target ,Process Chemistry and Technology ,extreme ultraviolet ,General Engineering ,021001 nanoscience & nanotechnology ,Laser ,optics ,lcsh:QC1-999 ,Computer Science Applications ,Wavelength ,lcsh:Biology (General) ,lcsh:QD1-999 ,lcsh:TA1-2040 ,Extreme ultraviolet ,microscopy ,0210 nano-technology ,business ,lcsh:Engineering (General). Civil engineering (General) ,lcsh:Physics - Abstract
Over the last decades, remarkable efforts have been made to improve the resolution in photon-based microscopes. The employment of compact sources based on table-top laser-produced soft X-ray (SXR) in the “water window” spectral range (λ = 2.3–4.4 nm) and extreme ultraviolet (EUV) plasma allowed to overcome the limitations imposed by large facilities, such as synchrotrons and X-ray free electron lasers (XFEL), because of their high complexity, costs, and limited user access. A laser-plasma double stream gas-puff target source represents a powerful tool for microscopy operating in transmission mode, significantly improving the spatial resolution into the nanometric scale, comparing to the traditional visible light (optical) microscopes. Such an approach allows generating the plasma efficiently, without debris, providing a high flux of EUV and SXR photons. In this review, we present the development and optimization of desktop imaging systems: a EUV and an SXR full field microscope, allowing to achieve a sub-50 nm spatial resolution with short exposure time and an SXR contact microscope, capable to resolve internal structures in a thin layer of sensitive photoresist. Details about the source, as well as imaging results for biological applications, will be presented and discussed.
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- 2020
18. Plasma characterization of the gas-puff target source dedicated for soft X-ray microscopy using SiC detectors
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Andrzej Bartnik, Alfio Torrisi, Lorenzo Torrisi, Przemyslaw Wachulak, Łukasz Węgrzyński, Henryk Fiedorowicz, Torrisi, A., Wachulak, P., Torrisi, L., Bartnik, A., Wegrzynski, L., and Fiedorowicz, H.
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Risk ,Plasma diagnostic technique ,Nuclear and High Energy Physics ,'Water-window' ,EUV ,Gas-pufftarget ,SiC detector ,Nuclear Energy and Engineering ,Safety, Risk, Reliability and Quality ,Waste Management and Disposal ,Condensed Matter Physics ,Instrumentation ,‘water-window’ ,Science ,Extreme ultraviolet lithography ,Nanotechnology ,01 natural sciences ,010309 optics ,0103 physical sciences ,gas-puff target ,010302 applied physics ,Water window ,business.industry ,Detector ,Plasma ,Characterization (materials science) ,Reliability and Quality ,Optoelectronics ,Soft x-ray microscopy ,Safety ,business - Abstract
An Nd:YAG pulsed laser was employed to irradiate a nitrogen gas-puff target. The interaction gives rise to the emission of soft X-ray (SXR) radiation in the ‘water window’ spectral range (λ= 2.3÷4.4 nm). This source was already successfully employed to perform the SXR microscopy. In this work, a Silicon Carbide (SiC) detector was used to characterize the nitrogen plasma emission in terms of gas-puff target parameters. The measurements show applicability of SiC detectors for SXR plasma characterization.
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- 2016
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19. Nanoscale Imaging Using a Compact Laser Plasma Source of Soft X-Rays and Extreme Ultraviolet (EUV)
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Joanna Czwartos, Jerzy Kostecki, Przemyslaw Wachulak, Andrzej Bartnik, Mesfin Getachew Ayele, Roman Jarocki, Alfio Torrisi, Miroslaw Szczurek, Henryk Fiedorowicz, Łukasz Węgrzyński, Wachulak, P., Torrisi, A., Ayele, M., Czwartos, J., Bartnik, A., Jarocki, R., Kostecki, J., Szczurek, M., Wegrzynski, L., and Fiedorowicz, H.
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Water window ,Materials science ,Nanostructure ,business.industry ,Extreme ultraviolet lithography ,02 engineering and technology ,Plasma ,Radiation ,021001 nanoscience & nanotechnology ,Laser ,01 natural sciences ,law.invention ,010309 optics ,Optics ,law ,Extreme ultraviolet ,0103 physical sciences ,Microscopy ,0210 nano-technology ,business - Abstract
Application of a compact laser plasma source of soft X-rays and extreme ultraviolet (EUV) in imaging with nanometer resolution is demonstrated. The source is based on a gas puff target irradiated with nanosecond laser pulses from a small commercial Nd:YAG laser. Soft X-ray radiation in the ‘water window’ spectral range and EUV near 10 nm are generated efficiently without production of target debris. Nanoscale imaging of biological samples as well as micro- and nanostructures using transmission soft X-ray and EUV microscopy based on Fresnel optics and soft X-ray contact microscopy is demonstrated.
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- 2018
20. Development and optimization of a 'water window' microscope based on a gas-puff target laser-produced plasma source
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Łukasz Węgrzyński, Henryk Fiedorowicz, Tomasz Fok, Alfio Torrisi, Andrzej Bartnik, Przemyslaw Wachulak, Torrisi, A., Wachulak, P., Bartnik, A., Wegrzynski, L., Fok, T., and Fiedorowicz, H.
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Water window ,Microscope ,Materials science ,Photon ,business.industry ,Physics ,QC1-999 ,02 engineering and technology ,Zone plate ,021001 nanoscience & nanotechnology ,Laser ,01 natural sciences ,Spectral line ,law.invention ,010309 optics ,Optics ,law ,0103 physical sciences ,Electron microscope ,0210 nano-technology ,business ,Visible spectrum - Abstract
A laser-plasma double stream gas-puff target source coupled with Fresnel zone plate (FZP) optics, operating at He-like nitrogen spectral line λ=2.88nm, is capable of acquire complementary information in respect to optical and electron microscopy, allowing to obtain high resolution imaging, compared to the traditional visible light microscopes, with an exposition time of a few seconds. The compact size and versatility of the microscope offers the possibility to perform imaging experiments in the university laboratories, previously restricted to large-scale photon facilities. Source and microscope optimization, and examples of applications will be presented and discussed.
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- 2018
21. A desktop extreme ultraviolet microscope based on a compact laser‑plasma light source
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Łukasz Węgrzyński, Tomasz Fok, Andrzej Bartnik, Przemyslaw Wachulak, Alfio Torrisi, Henryk Fiedorowicz, Wachulak, P. W., Torrisi, A., Bartnik, A., Wegrzynski, L., Fok, T., and Fiedorowicz, H.
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Physics ,Microscope ,Physics and Astronomy (miscellaneous) ,business.industry ,Extreme ultraviolet lithography ,Condenser (optics) ,General Engineering ,General Physics and Astronomy ,02 engineering and technology ,Physics and Astronomy(all) ,Zone plate ,021001 nanoscience & nanotechnology ,Laser ,01 natural sciences ,law.invention ,010309 optics ,Wavelength ,Optics ,law ,Extreme ultraviolet ,0103 physical sciences ,Optoelectronics ,0210 nano-technology ,business ,Image resolution - Abstract
A compact, desktop size microscope, based on laser-plasma source and equipped with reflective condenser and diffractive Fresnel zone plate objective, operating in the extreme ultraviolet (EUV) region at the wavelength of 13.8 nm, was developed. The microscope is capable of capturing magnified images of objects with 95-nm full-pitch spatial resolution (48 nm 25–75% KE) and exposure time as low as a few seconds, combining reasonable acquisition conditions with stand-alone desktop footprint. Such EUV microscope can be regarded as a complementary imaging tool to already existing, well-established ones. Details about the microscope, characterization, resolution estimation and real sample images are presented and discussed.
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- 2017
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22. Calibration of SiC detectors for nitrogen and neon plasma emission using gas-puff target sources
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Andrzej Bartnik, Lorenzo Torrisi, Przemyslaw Wachulak, Massimo Mazzillo, Alfio Torrisi, Antonella Sciuto, Lukasz Wegrzynski, Henryk Fiedorowicz, Tomasz Fok, Torrisi, A., Wachulak, P. W., Bartnik, A., Fok, T., Wegrzynski, L., Fiedorowicz, H., Mazzillo, M., Sciuto, A., and Torrisi, L.
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Materials science ,Band gap ,Analytical chemistry ,chemistry.chemical_element ,02 engineering and technology ,01 natural sciences ,law.invention ,Photodiode ,Neon ,chemistry.chemical_compound ,law ,silicon carbide ,0103 physical sciences ,Silicon carbide ,Electrical and Electronic Engineering ,Photodiodes ,plasma diagnostics ,X-ray detectors ,Electronic, Optical and Magnetic Materials ,010302 applied physics ,Detector ,plasma diagnostic ,021001 nanoscience & nanotechnology ,Laser ,Wavelength ,chemistry ,Quantum efficiency ,0210 nano-technology - Abstract
A silicon carbide (SiC) detector was calibrated in terms of quantum efficiency (QE) as well as its spectral responsivity at two different wavelength radiations ( $\lambda _{N_{2}} = 2.88$ nm and $\lambda _{N_{e}}= 1.35$ nm), using two different calibrated Si detectors, sensitive to the soft X-ray radiation ( $\lambda = 0.1\div 10$ nm). An Nd:YAG laser was employed to irradiate a nitrogen and a neon gas-puff target, producing a plasma, which is emitting radiation used for estimation of the detector parameters. A possibility to characterize a new generation of not commercial SiC detectors, with a higher band gap with respect to Si, employing a gas-puff target source, will be presented. Measurements show the SiC detectors QE, equal to 3.4 and 7.1 e/ph for 2.88- and 1.35-nm wavelength radiations, respectively. Calculations and results are reported and discussed.
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- 2017
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23. Nanoscale imaging applications of soft X-ray microscope based on a gas-puff target source
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Lukasz Wegrzynski, Tomasz Fok, Andrzej Bartnik, Alfio Torrisi, Henryk Fiedorowicz, Przemyslaw Wachulak, Wachulak, P. W., Torrisi, A., Bartnik, A., Wegrzynski, L., Fok, T., and Fiedorowicz, H.
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History ,Range (particle radiation) ,Microscope ,Materials science ,business.industry ,Condenser (optics) ,Nanotechnology ,02 engineering and technology ,Zone plate ,Radiation ,021001 nanoscience & nanotechnology ,01 natural sciences ,Computer Science Applications ,Education ,law.invention ,010309 optics ,Wavelength ,Optics ,law ,0103 physical sciences ,Microscopy ,0210 nano-technology ,business ,Image resolution - Abstract
A compact microscope based on nitrogen double stream gas puff target soft X-ray source, which emits radiation in the water-window spectral range, at the wavelength of λ = 2.88 nm, is presented. The microscope, employing ellipsoidal grazing incidence condenser and a Fresnel zone plate objective, is capable of capturing images with a 60 nm spatial resolution and exposure time as low as a few seconds. Examples of different applications of the SXR microscopy, and its applicability for various fields of science, are presented and discussed.
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- 2017
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24. Bioimaging using full field and contact EUV and SXR microscopes with nanometer spatial resolution
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Jana Turňová, Michal Odstrčil, Alfio Torrisi, Mesfin Getachew Ayele, Przemyslaw Wachulak, Tomáš Parkman, Henryk Fiedorowicz, Šárka Salačová, Joanna Czwartos, Andrzej Bartnik, Tomasz Fok, Łukasz Węgrzyński, Wachulak, P., Torrisi, A., Ayele, M., Czwartos, J., Bartnik, A., Wegrzynski, L., Fok, T., Parkman, T., Salacova, S., Turnova, J., Odstrcil, M., and Fiedorowicz, H.
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Nanometer resolution ,Nanostructure ,Materials science ,Microscope ,Extreme ultraviolet lithography ,02 engineering and technology ,Photoresist ,01 natural sciences ,law.invention ,Imaging ,010309 optics ,Fresnel zone plate ,Optics ,law ,0103 physical sciences ,General Materials Science ,Instrumentation ,Nanoscopic scale ,Image resolution ,gas puff target ,Fresnel zone plates ,EUV/SXR microscopy ,contact microscopy ,imaging ,nanometer resolution ,Contact microscopy ,Fluid Flow and Transfer Processes ,business.industry ,Process Chemistry and Technology ,General Engineering ,021001 nanoscience & nanotechnology ,Computer Science Applications ,Wavelength ,Extreme ultraviolet ,Gas puff target ,0210 nano-technology ,business - Abstract
We present our recent results, related to nanoscale imaging in the extreme ultraviolet (EUV) and soft X-ray (SXR) spectral ranges and demonstrate three novel imaging systems recently developed for the purpose of obtaining high spatial resolution images of nanoscale objects with the EUV and SXR radiations. All the systems are based on laser-plasma EUV and SXR sources, employing a double stream gas puff target. The EUV and SXR full field microscopes—operating at 13.8 nm and 2.88 nm wavelengths, respectively—are currently capable of imaging nanostructures with a sub-50 nm spatial resolution with relatively short (seconds) exposure times. The third system is a SXR contact microscope, operating in the “water-window” spectral range (2.3–4.4 nm wavelength), to produce an imprint of the internal structure of the investigated object in a thin surface layer of SXR light sensitive poly(methyl methacrylate) photoresist. The development of such compact imaging systems is essential to the new research related to biological science, material science, and nanotechnology applications in the near future. Applications of all the microscopes for studies of biological samples including carcinoma cells, diatoms, and neurons are presented. Details about the sources, the microscopes, as well as the imaging results for various objects will be shown and discussed.
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- 2017
25. Biological and material science applications of EUV and SXR nanoscale imaging systems based on double stream gas puff target laser plasma sources
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Henryk Fiedorowicz, Przemyslaw Wachulak, Tomasz Fok, Łukasz Węgrzyński, Alfio Torrisi, Andrzej Bartnik, Torrisi, A., Wachulak, P. W., Bartnik, A., Wegrzynski, L., Fok, T., and Fiedorowicz, H.
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Nuclear and High Energy Physics ,Nanometer resolution ,Microscope ,Fresnel zone ,Extreme ultraviolet lithography ,02 engineering and technology ,01 natural sciences ,law.invention ,Imaging ,010309 optics ,Fresnel zone plate ,Optics ,law ,0103 physical sciences ,Instrumentation ,Image resolution ,Water window ,EUV/SXR microscopy ,business.industry ,Chemistry ,Plasma ,021001 nanoscience & nanotechnology ,Laser ,Extreme ultraviolet ,Gas puff target ,0210 nano-technology ,business - Abstract
In the last 30 years much effort was made in order to develop compact laser-produced plasma sources emitting short wavelength radiation, from the soft X-ray (SXR, λ = 0.1–10 nm), especially in the so-called “water window” (λ = 2.3–4.4 nm) and in the extreme ultraviolet (EUV, λ = 10–120 nm) spectral ranges. Investigations in the nanometer scale, employing short wavelengths, drive the need for developing table-top microscopes, to overpass the limitations imposed by large facilities, such as their high complexity, maintenance costs and the limited user access. In this paper we present our recent results related to nanoscale imaging using such table-top and desk-top EUV/SXR microscopes. Their construction is based on a double stream gas puff target laser plasma source. The double stream gas puff target EUV and SXR sources, coupled with Fresnel zone plates (FZPs) represent a suitable platform for microscopy experiments in transmission mode, employing SXR and EUV radiation. It represents a possible complementary technique to synchrotrons and free-electron laser facilities. The sources, which are very easy to be used by a single user, allow for efficient generation of plasma radiation with high SXR/EUV flux. Presented herein compact microscopes, based on that source, allow one to capture SXR and EUV images of various samples, with 50–60 nm half-pitch spatial resolution (corresponding to a Rayleigh resolution of 100–120 nm) and exposure time of the order of few seconds. Thus, herein, we would like to present our recent developments and progress in compact desk-top SXR/EUV microscopy employing laser plasma gas puff target sources, showing examples of acquired images and possible applications.
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- 2017
26. Soft X-ray microscope with nanometer spatial resolution and its applications
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Alfio Torrisi, Henryk Fiedorowicz, Andrzej Bartnik, Lukasz Wegrzynski, Przemyslaw Wachulak, Z. Patron, Tomasz Fok, Wachulak, P. W., Torrisi, A., Bartnik, A., Wegrzynski, L., Fok, T., Patron, Z., and Fiedorowicz, H.
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SXR microscopy ,Nanometer resolution ,Atomic de Broglie microscope ,Materials science ,Microscope ,business.industry ,Condenser (optics) ,Soft X-rays (SXR) ,02 engineering and technology ,Zone plate ,021001 nanoscience & nanotechnology ,01 natural sciences ,law.invention ,010309 optics ,Optics ,law ,0103 physical sciences ,Microscopy ,Optic ,Gas puff target ,4Pi microscope ,0210 nano-technology ,business ,Image resolution ,X-ray microscope - Abstract
A compact size microscope based on nitrogen double stream gas puff target soft X-ray source, which emits radiation in water-window spectral range at the wavelength of λ = 2.88 nm is presented. The microscope employs ellipsoidal grazing incidence condenser mirror for sample illumination and silicon nitride Fresnel zone plate objective for object magnification and imaging. The microscope is capable of capturing water-window images of objects with 60 nm spatial resolution and exposure time as low as a few seconds. Details about the microscopy system as well as some examples of different applications from various fields of science, are presented and discussed.
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- 2016
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27. Characterization and optimization of images acquired by a compact soft X-ray microscope based on a double stream gas-puff target source
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M. Fahad Nawaz, Przemyslaw Wachulak, Lukasz Wegrzynski, Henryk Fiedorowicz, Alfio Torrisi, Alexandr Jancarek, Andrzej Bartnik, Torrisi, A., Wachulak, P., Nawaz, M. F., Bartnik, A., Wegrzynski, L., Jancarek, A., and Fiedorowicz, H.
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Materials science ,Microscope ,Data processing method ,02 engineering and technology ,Zone plate ,01 natural sciences ,law.invention ,010309 optics ,Software ,Optics ,law ,0103 physical sciences ,Inspection with x-ray ,Instrumentation ,Mathematical Physics ,Soft x ray ,Interaction of radiation with matter ,business.industry ,Plasma ,021001 nanoscience & nanotechnology ,Laser ,Characterization (materials science) ,Signal-to-noise ratio (imaging) ,0210 nano-technology ,business - Abstract
Using a table-top size soft X-ray (SXR) microscope, based on a laser plasma source with a double stream gas-puff target and a Fresnel zone plate objective, series of images of test samples were acquired. Characterization and optimization of the acquisition parameters were studied and evaluated in terms of signal to noise ratio (SNR). Conclusions for the optimization of SXR imaging were reached. Similar SNR measurements might be performed to characterize other SXR imaging systems as well. Software enabling live calculation of the SNR during the image acquisition might be introduced in future in the compact imaging systems for optimal image acquisition or for benchmarking purposes.
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- 2016
28. Nanoimaging using soft X-ray and EUV laser-plasma sources
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Joanna Czwartos, Tomasz Fok, Przemyslaw Wachulak, Alfio Torrisi, Andrzej Bartnik, Henryk Fiedorowicz, Mesfin Getachew Ayele, Łukasz Węgrzyński, Wachulak, P., Torrisi, A., Ayele, M., Bartnik, A., Czwartos, J., Wegrzynski, L., Fok, T., and Fiedorowicz, H.
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Soft x ray ,Materials science ,Microscope ,business.industry ,Physics ,QC1-999 ,Extreme ultraviolet lithography ,02 engineering and technology ,Plasma ,Photoresist ,021001 nanoscience & nanotechnology ,Laser ,01 natural sciences ,law.invention ,010309 optics ,Wavelength ,Optics ,law ,0103 physical sciences ,0210 nano-technology ,business ,Image resolution - Abstract
In this work we present three experimental, compact desk-top imaging systems: SXR and EUV full field microscopes and the SXR contact microscope. The systems are based on laser-plasma EUV and SXR sources based on a double stream gas puff target. The EUV and SXR full field microscopes, operating at 13.8 nm and 2.88 nm wavelengths are capable of imaging nanostructures with a sub-50 nm spatial resolution and short (seconds) exposure times. The SXR contact microscope operates in the “water-window” spectral range and produces an imprint of the internal structure of the imaged sample in a thin layer of SXR sensitive photoresist. Applications of such desk-top EUV and SXR microscopes, mostly for biological samples (CT26 fibroblast cells and Keratinocytes) are also presented. Details about the sources, the microscopes as well as the imaging results for various objects will be presented and discussed. The development of such compact imaging systems may be important to the new research related to biological, material science and nanotechnology applications.
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- 2018
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29. Laser plasma sources of soft x-rays and extreme ultraviolet (EUV) for application in science and technology
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Andrzej Bartnik, Łukasz Węgrzyński, Przemyslaw Wachulak, Tomasz Fok, Miroslaw Szczurek, Henryk Fiedorowicz, Roman Jarocki, Mesfin Getachew Ayele, A. Szczurek, Alfio Torrisi, Daniel Adjei, Jerzy Kostecki, Inam Ul Ahad, Bartnik, A., Wachulak, P., Jarocki, R., Kostecki, J., Szczurek, M., Adjei, D., Ahad, I. U., Ayele, M. G., Fok, T., Szczurek, A., Torrisi, A., Wegrzynski, L., and Fiedorowicz, H.
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EUV photo-ionized plasma ,Materials science ,business.industry ,Extreme ultraviolet lithography ,Energy conversion efficiency ,EUV processing material ,Photoionization ,Plasma ,Radiation ,Laser ,law.invention ,EUV radiography and tomography ,extreme ultraviolet (EUV) ,soft x-ray contact microscopy ,Optics ,radiobiology ,law ,soft x-ray microscopy ,Extreme ultraviolet ,laser plasma ,Optoelectronics ,soft x-rays ,Irradiation ,business ,laser plasma soft x-ray and EUV source - Abstract
Laser plasma sources of soft x-rays an d extreme ultraviolet (EUV) developed in our laboratory for application in various areas of technology and science are presented. The sources are based on a laser-irradiated gas puff target approach. The targets formed by pulsed injection of gas under high-pressure are irradiated with nanosecond laser pulses from Nd:YAG lasers. We use commercial lasers generating pulses with time duration from 1ns to 10ns and energies from 0.5J to 10J at 10Hz repetition rate. The gas puff targets are produced using a double valve system equipped with a special nozzle to form a double-stream gas puff target which secures high conversion efficiency without degradation of the nozzle. The use of a gas puff target instead of a solid target makes generation of laser plasmas emitting soft x-rays and EUV possible without target debris production. The sources are equipped with various optical systems, including grazing incidence axisymmetric ellipsoidal mirrors, a lobster eye type grazing incidence multi-foil mirror, and an ellipsoidal mirror with Mo/Si multilayer coating, to collect so ft x-ray and EUV radiation and form the radiation beams. In this paper new applications of these sources in various fields, including soft x-ray and EUV imaging in nanoscale, EUV radiography and tomography, EUV materials processing and modification of polymer surfaces, EUV photoionization of gases, radiobiology and soft x-ray contact microscopy are reviewed. Keywords: laser plasmas, soft x-rays, extreme ultraviolet (EUV), laser plasma soft x-ray and EUV sources, soft x-ray microscopy, EUV radiography and tomography, EUV processing materials, radiobiology, soft x-ray contact microscopy, EUV photo-ionized plasmas
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- 2015
30. A compact 'water-window' microscope with 60-nm spatial resolution based on a double stream gas-puff target and Fresnel zone plate optics
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M. F. Nawaz, Daniel Adjei, Andrzej Bartnik, Alfio Torrisi, Henryk Fiedorowicz, Tomasz Fok, Šárka Vondrová, Alexandr Jancarek, Jerzy Kostecki, Łukasz Węgrzyński, Przemyslaw Wachulak, Jana Turňová, Wachulak, P., Torrisi, A., Nawaz, M. F., Adjei, D., Bartnik, A., Kostecki, J., Wegrzynski, L., Vondrova, S., Turnova, J., Fok, T., Jancarek, A., and Fiedorowicz, H.
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Diffraction ,SXR microscopy ,Water window ,Microscope ,Materials science ,business.industry ,Condenser (optics) ,Soft X-rays (SXR) ,Zone plate ,Laser ,law.invention ,Wavelength ,Fresnel zone plate ,Optics ,law ,"water-window" ,gas puff target source ,business ,nanometer resolution ,Image resolution - Abstract
Radiation with shorter illumination wavelength allows for extension of the diffraction limit towards nanometer scale, which is a straightforward way to significantly improve a spatial resolution in photon based microscopes. Soft X-ray (SXR) radiation, from the so called ”water window” spectral range, λ=2.3-4.4 nm, which is particularly suitable for biological imaging due to natural optical contrast, providing much better spatial resolution than one obtained with visible light microscopes. The high contrast is obtained because of selective absorption of radiation by carbon and water, being constituents of the biological samples. We present a desk-top system, capable of resolving 60 nm features in few seconds exposure time. We exploit the advantages of a compact, laser-plasma SXR source, based on a double stream nitrogen gas puff target, developed at the Institute of Optoelectronics, Military University of Technology. The source, emitting quasi-monochromatic, incoherent radiation, in the “water widow” spectral range at λ = 2.88 nm, is coupled with ellipsoidal, grazing incidence condenser and Fresnel zone plate objective. The construction of the microscope with some recent images of test and real samples will be presented and discussed.
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- 2015
31. Nanoscale imaging and optimization of a compact 'water window' SXR microscope
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Przemyslaw Wachulak, Roman Jarocki, Jerzy Kostecki, Alfio Torrisi, Fahad Nawaz, Lukasz Wegrzynski, Andrzej Bartnik, Miroslaw Szczurek, Henryk Fiedorowicz, Torrisi, A., Wachulak, P., Nawaz, F., Bartnik, A., Kostecki, J., Wegrzynski, L., Jarocki, R., Szczurek, M., and Fiedorowicz, H.
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Water window ,Microscope ,Materials science ,business.industry ,Extreme ultraviolet lithography ,Zone plate ,SXR radiation ,Laser ,Optics ,law.invention ,Imaging ,Fresnel zone plate ,Soft X-ray microscopy ,Gas puff target source ,law ,"water-window" ,Extreme ultraviolet ,Signal-to-noise ratio ,business ,Biological imaging ,Image resolution - Abstract
The wavelength diffraction limit, described by the Rayleigh criterion, can be overcome if short wavelength radiations are employed, thus it is possible to resolve smaller features by the use of radiation in the extreme ultraviolet (EUV) and soft X-ray (SXR) spectral ranges. In particular way, radiation from the “water window” spectral range, which extends between K-absorption edges of carbon and oxygen (280÷540 eV), could be used in order to obtain high-contrast biological imaging. Laser-plasma double stream gas puff target source is suitable for SXR microscopy in the “water window” spectral range, which recently allowed to develop a system, operating at He-like nitrogen spectral line λ=2.88 nm, which permits to obtain images with half-pitch spatial resolution of ∼ 60 nm, exposure time as low as a few seconds and represents an important alternative for high resolution imaging for biomedical applications, material science and nanotechnology using a very compact laser source. The goal of measurements, presented herein, is to show SXR images of various biological samples, proving high contrast in the “water window” and characterize in more detail such compact microscopy system, based on a laser plasma source with a double stream gas puff target and a Fresnel zone plate (FZP) objective. The influence of various acquisition parameters on the quality of the obtained SXR images, expressed in terms of a signal-to-noise (SNR) will be demonstrated. Moreover, because the measurements are performed on SXR images, similar measurements might be performed as a benchmark in order to characterize different imaging systems as well.
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- 2015
32. Desktop water window microscope using a double-stream gas puff target source
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Daniel Adjei, Andrzej Bartnik, Jerzy Kostecki, Lukasz Wegrzynski, Przemyslaw Wachulak, Alfio Torrisi, Miroslaw Szczurek, Henryk Fiedorowicz, Roman Jarocki, Wachulak, P. W., Torrisi, A., Bartnik, A., Adjei, D., Kostecki, J., Wegrzynski, L., Jarocki, R., Szczurek, M., and Fiedorowicz, H.
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Water window ,Microscope ,Materials science ,Physics and Astronomy (miscellaneous) ,business.industry ,Condenser (optics) ,General Engineering ,General Physics and Astronomy ,Radiation ,Zone plate ,law.invention ,Wavelength ,Optics ,law ,business ,Image resolution ,X-ray microscope - Abstract
A compact, desktop size, microscope, based on nitrogen double-stream gas puff target soft X-ray source, which emits radiation in water window spectral range at the wavelength of λ = 2.88 nm, is demonstrated. The microscope employs ellipsoidal grazing incidence condenser mirror for sample illumination and Fresnel zone plate objective. The microscope is capable of capturing magnified images of objects with 60 nm spatial resolution and exposure time as low as a few seconds. Details about the source and the microscope as well as a few examples of different applications are presented and discussed.
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- 2015
33. Fresnel zone plate telescope for condenser alignment in water-window microscope
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Jerzy Kostecki, Andrzej Bartnik, Miroslaw Szczurek, Roman Jarocki, Łukasz Węgrzyński, Henryk Fiedorowicz, Alfio Torrisi, Tomasz Fok, Przemyslaw Wachulak, Wachulak, P. W., Torrisi, A., Bartnik, A., Wegrzynski, L., Fok, T., Jarocki, R., Kostecki, J., Szczurek, M., and Fiedorowicz, H.
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SXR microscopy ,Water window ,Microscope ,business.industry ,Condenser (optics) ,imaging system ,Image plane ,Zone plate ,fresnel zone plate ,gas puff target ,Atomic and Molecular Physics, and Optics ,Electronic, Optical and Magnetic Materials ,law.invention ,Telescope ,Optics ,x-ray optics ,law ,soft x-rays (SXR) ,Spatial frequency ,business ,Image resolution ,SXR telescope - Abstract
Microscopes operating at short wavelengths, in the extreme ultraviolet and soft x-ray spectral region, require careful condenser positioning to avoid possible artifacts related to enhancing or diminishing certain spatial frequencies in the image plane. Various methods are often used to visualize the condenser illumination pattern, including direct visualization on a CCD camera; however, these are not always straightforward to use. We present and discuss a novel and convenient method to image a condenser illumination pattern upstream the sample plane, using two zone plates with matched numerical apertures. This imaging system, operating herein in the water-window spectral range in telescope configuration, allows us to change the distance between the conjugated planes, thus overcoming limitations related to the geometry of the vacuum system. This geometry, which is optimized for the highest possible spatial resolution allowed by the zone-plate objective, is not necessarily particularly good for visualization of the condenser illumination pattern. The presented method was demonstrated with a compact, gas puff target source based soft x-ray microscope, which is capable of resolving 60 nm features (half-pitch resolution), requires a few seconds exposure time, and is debris-free due to the gaseous nature of the target for soft x-ray generation. The method, presented herein, may solve mentioned vacuum system geometry limitations. Also, it can easily be extended to other systems and other wavelengths, provided a proper optic is used. Modes of operation and the results are presented and discussed.
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- 2015
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34. Nanoimaging Using Soft X-Ray and EUV Sources Based on Double Stream Gas Puff Targets
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Łukasz Węgrzyński, Tomasz Fok, A. Bartnik, Henryk Fiedorowicz, Przemyslaw Wachulak, Joanna Czwartos, Mesfin Getachew Ayele, Alfio Torrisi, Wachulak, P., Torrisi, A., Ayele, M., Bartnik, A., Wegrzynski, L, Fok, T., Czwartos, J., and Fiedorowicz, H.
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010309 optics ,Soft x ray ,Materials science ,Optics ,business.industry ,Extreme ultraviolet lithography ,0103 physical sciences ,General Physics and Astronomy ,02 engineering and technology ,021001 nanoscience & nanotechnology ,0210 nano-technology ,business ,01 natural sciences - Abstract
In this work we present recent results on nanoscale imaging in the extreme ultraviolet and soft X-ray spectral ranges, describing three novel imaging systems dedicated for high spatial resolution imaging of nanoscale objects with the extreme ultraviolet and soft X-ray radiations. The extreme ultraviolet and soft X-ray full field microscopes operate at 13.8 nm and 2.88 nm wavelengths and are capable of imaging of nanostructures with a sub-50 nm spatial resolution. A soft X-ray contact microscope operates in the “water-window” spectral range from 2.3 to 4.4 nm wavelength, to obtain images of an internal structure of the investigated object in a thin surface layer of soft X-ray light sensitive photoresist. The development of such compact imaging systems may, in the near future, be important from the point of view of new research related to biological, material science, and nanotechnology applications. Such preliminary applications are also shown in the studies of biological samples, including carcinoma cells, diatoms, and neurons.
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35. Soft x-ray imaging with incoherent sources
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Joanna Czwartos, Michal Odstrcil, Mesfin Getachew Ayele, Przemyslaw Wachulak, Łukasz Węgrzyński, Andrzej Bartnik, Tomasz Fok, Henryk Fiedorowicz, J. Turnova, Tomáš Parkman, Šárka Vondrová, Alfio Torrisi, Wachulak, P., Torrisi, A., Ayele, M., Bartnik, A., Czwartos, J., Wegrzynski, L., Fok, T., Parkman, T., Vondrova, S., Turnova, J., Odstrcil, M., and Fiedorowicz, H.
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Nanometer resolution ,Materials science ,Microscope ,Extreme ultraviolet lithography ,02 engineering and technology ,01 natural sciences ,Imaging ,law.invention ,010309 optics ,Fresnel zone plate ,Optics ,law ,EUV/SXR Microscopy ,0103 physical sciences ,Image resolution ,Contact microscopy ,Thin layers ,business.industry ,Resolution (electron density) ,021001 nanoscience & nanotechnology ,Laser ,Wavelength ,Extreme ultraviolet ,Gas puff target ,0210 nano-technology ,business - Abstract
In this work we present experimental, compact desk-top SXR microscope, the EUV microscope which is at this stage a technology demonstrator, and finally, the SXR contact microscope. The systems are based on laser-plasma EUV and SXR sources, employing a double stream gas puff target. The EUV and SXR full field microscopes, operating at 13.8 nm and 2.88 nm wavelengths, respectively, are capable of imaging nanostructures with a sub-50 nm spatial resolution with relatively short (seconds) exposure times. The SXR contact microscope operates in the "water-window" spectral range, to produce an imprint of the internal structure of the sample in a thin layer of SXR light sensitive photoresist. Applications of such desk-top EUV and SXR microscopes for studies of variety of different samples - test objects for resolution assessment and other objects such as carbon membranes, DNA plasmid samples, organic and inorganic thin layers, diatoms, algae and carcinoma cells, are also presented. Details about the sources, the microscopes as well as the imaging results for various objects will be presented and discussed. The development of such compact imaging systems may be important to the new research related to biological, material science and nanotechnology applications.
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