103 results on '"Weinreich, Wenke"'
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2. Spectroscopic analysis of ultra-thin TiN as a diffusion barrier for lithium-ion batteries by ToF-SIMS, XPS, and EELS
3. Enablement of CMOS integrated sensor, harvesting and storage applications by ferroelectric HfO2
4. Optimized electrode and interface for enhanced reliability of high-k based metal–insulator–metal capacitors
5. Optimization of LPCVD phosphorous-doped SiGe thin films for CMOS-compatible thermoelectric applications
6. Atomic Layer Deposition of Li4Ti5O12: Enabling Ultrafast Charging 3D Thin-Film Batteries
7. Atomic Layer Deposition of Textured Li 4 Ti 5 O 12 : A High‐Power and Long‐Cycle Life Anode for Lithium‐Ion Thin‐Film Batteries
8. Hafnium Zirconium Oxide Thin Films for CMOS Compatible Pyroelectric Infrared Sensors
9. Enhanced pyroelectric response at morphotropic and field-induced phase transitions in ferroelectric hafnium oxide thin films
10. Aging in Ferroelectric Si‐Doped Hafnium Oxide Thin Films
11. Quantifying non-centrosymmetric orthorhombic phase fraction in 10 nm ferroelectric Hf0.5Zr0.5O2 films
12. Surface Dependent Performance of Ultrathin TiN Films as an Electrically Conducting Li Diffusion Barrier for Li-Ion Based Devices
13. Surface-Dependent Performance of Ultrathin TiN Films as an Electrically Conducting Li Diffusion Barrier for Li-Ion-Based Devices
14. Piezoelectric Response of Polycrystalline Silicon‐Doped Hafnium Oxide Thin Films Determined by Rapid Temperature Cycles
15. Detailed Correlation of Electrical and Breakdown Characteristics to the Structural Properties of ALD Grown HfO2- and ZrO2-based Capacitor Dielectrics
16. Doping Ferroelectric Hafnium Oxide by in-Situ Precursor Mixing
17. Pyroelectric Energy Conversion in Doped Hafnium Oxide (HfO 2 ) Thin Films on Area‐Enhanced Substrates
18. Ferroelectric and pyroelectric properties of polycrystalline La-doped HfO2 thin films
19. Pyroelectric Energy Conversion in Doped Hafnium Oxide (HfO2) Thin Films on Area-Enhanced Substrates
20. High-density energy storage in Si-doped hafnium oxide thin films on area-enhanced substrates
21. Atomic Layer Deposition of Textured Li4Ti5O12: A High‐Power and Long‐Cycle Life Anode for Lithium‐Ion Thin‐Film Batteries.
22. Frequency domain analysis of pyroelectric response in silicon-doped hafnium oxide (HfO2) thin films
23. Layer thickness scaling and wake-up effect of pyroelectric response in Si-doped HfO2
24. Development of Rutile Titanium Oxide Thin Films as Battery Material Component Using Atomic Layer Deposition
25. ToF-SIMS 3D Analysis of Thin Films Deposited in High Aspect Ratio Structures via Atomic Layer Deposition and Chemical Vapor Deposition
26. Formation of highly conformal spinel lithium titanate thin films based on a novel three-step atomic layer deposition process
27. High-density energy storage in Si-doped hafnium oxide thin films on area-enhanced substrates
28. Mesoscopic analysis of leakage current suppression in ZrO2/Al2O3/ZrO2 nano-laminates.
29. Development of Rutile Titanium Oxide Thin Films as Battery Material Component Using Atomic Layer Deposition.
30. Ultimate scaling of TiN/ZrO2/TiN capacitors: Leakage currents and limitations due to electrode roughness.
31. Influence of the amorphous/crystalline phase of Zr1-xAlxO2 high-k layers on the capacitance performance of metal insulator metal stacks.
32. Influence of the amorphous/crystalline phase of [Zr.sub.1-x][Al.sub.x][O.sub.2] high-k layers on the capacitance performance of metal insulator metal stacks
33. Herstellung und Charakterisierung ultradünner ZrO2-basierter Schichten als Isolatoren in Metall-Isolator-Metall Kondensatoren
34. Surface self-organization and structure of highly doped n-InGaAs ultra-shallow junctions
35. ALD ZrO2 processes for BEoL device applications
36. Scaling and optimization of high-density integrated Si-capacitors
37. Ultra-thin high density capacitors for advanced packaging solutions.
38. High-density capacitors for SiP and SoC applications based on three-dimensional integrated metal-isolator-metal structures
39. Structural properties of as deposited and annealed ZrO2 influenced by atomic layer deposition, substrate, and doping
40. TEMAZ/O3 atomic layer deposition process with doubled growth rate and optimized interface properties in metal–insulator–metal capacitors
41. Detailed leakage current analysis of metal–insulator–metal capacitors with ZrO2, ZrO2/SiO2/ZrO2, and ZrO2/Al2O3/ZrO2 as dielectric and TiN electrodes
42. Role of defect relaxation for trap-assisted tunneling in high-κthin films: A first-principles kinetic Monte Carlo study
43. Monte Carlo Simulation of Leakage Currents in $ \hbox{TiN/ZrO}_{2}/\hbox{TiN}$ Capacitors
44. Ultimate scaling of TiN/ZrO2/TiN capacitors: Leakage currents and limitations due to electrode roughness
45. Macroscopic and microscopic electrical characterizations of high-k ZrO2 and ZrO2/Al2O3/ZrO2 metal-insulator-metal structures
46. Modeling of leakage currents in high-κ dielectrics: Three-dimensional approach via kinetic Monte Carlo
47. Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics
48. High-K: Latest Developments and Perspectives
49. Detailed leakage current analysis of metal-insulator-metal capacitors with ZrO2, ZrO2/SiO2/ZrO2, and ZrO2/Al2O3/ZrO2 as dielectric and TiN electrodes.
50. Monte Carlo Simulation of Leakage Currents in \TiN/ZrO2/\TiN Capacitors.
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