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Analyzes the laser ablative hole formation in amorphous tellurium-selenium-iodine films. Information on laser ablative recording; Factors that cause the formation of a hole in thin films; Discussion on the preparation and properties of the films; Physical aspects of the laser ablative process; Description of the structure of the ablative holes in thin films.

Studies the three-dimensional image of the surface roughness of sputtered iron-oxide thin films obtained using a scanning tunneling microscope. Limitations of the electron microscopy for surface three-dimensional studies; Details on the experiment; Discussion on the results of the study.

Presents a crystallographic template for the growth of the range of iron-nitrogen (Fe-N) phases on silicon(001) by lattice matching on selected underlayers. Magnetic characterization of Fe-N phases; Result of the epitaxial iron nitride film deposition; Measurement of film thickness.

In this work thin films of Ti6Al4V have been grown by rf magnetron sputtering, on steel 316L and they have been subjected to a later treatment of nitrurated by plasma, in function of the time, to settle down if changes exist in the mechanical properties for the incorporation from the nitrogen to the crystalline lattice of the film. The conditions used to grow these films were: Pressure 7x10-3 mbar, time of 1 hour and with a power 400 W. The films were nitrurated to a difference of potential of 500 V, to a pressure of 3 torr. The results of EDX reveal that the films this compound on the average of 78,3% Wt of Ti, 6.% Wt of Al, 12.0% Wt of V and 2.1 Wt % N. On the other hand, the results of DRX show that the film grows along the plane (110) of the β phase (Ti stabilized with V) of the alloy. Finally, the mechanical tests carried out on the films nitrurated indicate that the microhardness increases lightly. [ABSTRACT FROM AUTHOR]

Conversion-electron Mössbauer spectra of epitaxial α″-Fe16N2 and α′-Fe8N films have been studied and their differences are discussed in detail. The Mössbauer spectrum of α″-Fe16N2 can be decomposed into three subspectra, which correspond to the 4 d, 8 h and 4 c sites. The Mössbauer spectrum of α′-Fe8N can be fitted using four spectra based on a nitrogen-atom-random-distribution model. The average hyperfine field is larger (3%) for α″-Fe16N2 than for α′-Fe8N, which is approximately consistent with a 4.1% enhancement of the magnetic moments for α″-Fe16N2. The iron moments tend to locate in the film plane for α″-Fe16N2 and to arrange perpendicularly to the film plane for α′-Fe8N. [ABSTRACT FROM AUTHOR]

Investigates the deposition of epitaxial Fe[sub 16]N[sub 2] thin films by reactive nitrogen sputtering. Determination of the average magnetic moment; Application of electron Mossbauer spectroscopy; Measurement of magnetic moments using the vibrating sample magnetometer.

Examines the influence of strain fields on the development of a macroscopic pattern in the crystallization of Te[sub 3]Se[sub 4] and Te[sub 3]Se[sub 4]I amorphous thin films. Cause of the appearance of the strain pattern; Evolution of a macroscopic branching crystalline morphology; Development of shared morphological domains by the transformation interference.

This work presents the use of the technique of current pulsant inverse, pulse direct current and direct current for electrodeposition thin films Cu/Cd in double-layer shape on Zamak substrate. The influence of the different variables was studied involved in each one of the processes: voltage and time of deposition (VHigh and tHigh), voltage and time of breakup (VLow and tLow) and the load cycle (θ=tHigh/tHigh+tLow), obtaining as answer the monitory of the average anodic (ILow) and cathodic (IHigh) in function of the time anodic (tLow) and cathodic (tHigh), respectively. The electrodeposits of Cu/Cd was characterized by means ray x diffraction being observed the structure and composition in each one of the films obtained. It was observed that the control pulsant of the voltage during the deposit to influence in the composition of the electrodeposits. [ABSTRACT FROM AUTHOR]

This work presents the equivalent electric circuit RC used for the characterization from the behavior to the corrosion of Ti6Al4V thin films in atmospheres simulating biological fluids. The films were deposited on 316L steel substrates by rf magnetron sputtering. The electrochemical technique employed to evaluate the behavior of corrosion was the Electrochemical Impedance Spectroscopy (EIS), by which Bode diagrams were carried out, permitting to obtaining the parameters of corrosion: resistance of the electrolytic solution, polarization resistance and impedance of transfer of electric load in function of the frequency. [ABSTRACT FROM AUTHOR]