46 results on '"Kazazis, Dimitrios"'
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2. Effects of temporal coherence on EUV lensless imaging
3. Enhancing the sensitivity of a high resolution negative-tone metal organic photoresist for extreme ultra violet lithography
4. EUV mask defect material characterization through actinic lensless imaging
5. Ongoing development of ultrafast DUV pulse laser repair for EUV photomasks
6. Resolution enhancement for lensless mask metrology with RESCAN.
7. EUV reticle inspection using phase retrieval algorithms - a performance comparison.
8. Lensless metrology for semiconductor lithography at EUV.
9. Advanced EUV negative tone resist and underlayer approaches exhibiting sub-20nm half-pitch resolution.
10. Absorber and phase defect inspection on EUV reticles using RESCAN.
11. Advancements in EUV photoresists for high-NA lithography.
12. Lensless EUV mask inspection for anamorphic patterns
13. Chemically-amplified backbone scission (CABS) resist for EUV lithography
14. Electrically tunable filter based on plasmonic phase retarder and liquid crystals
15. Illumination control in lensless imaging for EUV mask inspection and review
16. New Resist and Underlayer Approaches toward EUV Lithography.
17. Experimental evaluation of the impact of EUV pellicles on reticle imaging.
18. Studying Resist Performance for Contact Holes Printing using EUV Interference Lithography.
19. Phase defect inspection on EUV masks using RESCAN.
20. Ultra-sensitive EUV resists based on acid-catalyzed polymer backbone breaking.
21. Through-pellicle inspection of EUV masks.
22. Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists.
23. Multi-Trigger Resist for Electron Beam Lithography.
24. Actinic inspection of EUV reticles with arbitrary pattern design.
25. Enhancing the sensitivity of a high resolution negative-tone metal organic photoresist for extreme ultra violet lithography.
26. Resolution enhancement for lensless mask metrology with RESCAN
27. EUV reticle inspection using phase retrieval algorithms: a performance comparison
28. Absorber and phase defect inspection on EUV reticles using RESCAN
29. Advanced EUV negative tone resist and underlayer approaches exhibiting sub-20nm half-pitch resolution
30. Advancements in EUV photoresists for high-NA lithography
31. Experimental evaluation of the impact of EUV pellicles on reticle imaging
32. Studying resist performance for contact holes printing using EUV interference lithography
33. Phase defect inspection on EUV masks using RESCAN
34. Ultra-sensitive EUV resists based on acid-catalyzed polymer backbone breaking
35. Through-pellicle inspection of EUV masks
36. Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists
37. EUV mask defect material characterization through actinic lensless imaging.
38. Ongoing development of ultrafast DUV pulse laser repair for EUV photomasks.
39. Lensless EUV mask inspection for anamorphic patterns.
40. Chemically-amplified backbone scission (CABS) resist for EUV lithography.
41. Laser repair and clean of extreme ultraviolet lithography photomasks.
42. Electrically tunable filter based on plasmonic phase retarder and liquid crystals.
43. Lensless metrology for semiconductor lithography at EUV
44. Actinic inspection of EUV reticles with arbitrary pattern design
45. Multi-trigger resist for electron beam lithography
46. Extreme ultraviolet patterning of tin-oxo cages
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